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Article – Journal of Nanoscience and Technology

Journal of Nanoscience and Technology, Volume 5,Issue 4,2019 Pages 761-764

Synthesis and Characterization of Chemically Deposited Nickel Sulphide Thin Film Electrodes for Electrochemical Supercapacitor Application
M.S. Sonawane*, A.M. Patil, R.S. Patil


This work is licensed under a Creative Commons Attribution 4.0 International License

Nickel sulphide (NiS) thin films were synthesized on glass and stainless steel (SS) substrates using a simple chemical bath deposition route. The structural, surface morphology were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry, galvanostatic charge-discharge test and electrochemical impedance spectroscopy. In cyclic voltammetry (CV) studies, the NiS electrode exhibits the specific capacitance of 441 Fg-1 has been obtained in 2 M KOH solution at a scan rate 10 mVs-1 within the potential range 0 to 0.8 V vs. Ag/AgCl. In charge-discharge behaviors, the supercapacitive parameters such as specific energy (S.E.) and specific power (S.P.) are 10.1 Whkg−1 and 4.5 KWkg−1 respectively. Impedance spectroscopic analysis revealed that the ESR is 11 Ω in KOH electrolyte.

Keywords: Nickel Sulphide Thin Films; Chemical Bath Deposition; Supercapacitor;

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